UV-solvent annealing of PDMS-majority and PS-majority PS-b-PDMS block copolymer films
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چکیده
منابع مشابه
UV-solvent annealing for morphology and orientation control in self-assembled PS-PDMS thin films
The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority ( fPS=68%, Mn=53 kg mol ), the other with PDMS block as majority ( fPDMS=67%, Mn=44 kg mol ). A 5 min UV irradi...
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The orientation changes of perpendicular cylindrical microdomains in polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) thin films upon annealing in different solvent vapors were investigated by in situ grazing incidence small-angle X-ray scattering (GISAXS) and ex situ scanning force microscopy (SFM). The swelling of P4VP perpendicular cylinders (C⊥) in chloroform, a non-selective solvent vap...
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ژورنال
عنوان ژورنال: Nanotechnology
سال: 2016
ISSN: 0957-4484,1361-6528
DOI: 10.1088/0957-4484/27/46/465301